关键词: 原子层沉积, 石英晶体微天平, 原位测量

Abstract: Atomic layer deposition of inorganic nano-film technology is widely used in military and civilian applications.In this paper,the in-situ quartz crystal microbalance measurement system was used to study the growth process of atomic layer deposition inorganic film,and the film thickness was measured by quartz crystal microbalance.By studying the atomic layer deposition reaction conditions,the in-situ measurement results of the inorganic film thickness of the atomic layer deposition are used instead of the optical measurement results of the film thickness.It can solve the problem that the thickness of the atomic layer deposited film in various complex chambers cannot be accurately measured.

Key words: Atomic layer deposition, Quartz crystal microbalance, In-situ measurement