Abstract: An on-wafer calibration method was provided to solve the problem that the current parameters of the PCM equipment could not to be calibrated on probe end.The on-wafer sampling resistance standards were developed by thin-film sputtering and ion implantation method of semiconductor process.A calibrating system with temperature control function was established,which could calibrate the standards.The calibration results could be traced to the highest national standard of DC resistance parameters.PCM equipment applied voltage to on-wafer sampling resistance standards and parallel connection standard voltmeter.The on-wafer calibration of current parameters 1 nA~100 mA by applying voltage to measure current.The method could carry out effective on-wafer calibration of current parameters for PCM equipment and ensured the accuracy of the current parameters of the PCM equipment on probe end.

Key words: Current, Probe, Calibration, Semiconductor, Resistance