Abstract: The establishment of resistance standard based on Quantum Hall Effect (QHE) is a cutting-edge metrology technology,which is the highest standard to define the resistance in the world.The core component is Quantum Hall Resistance(QHR) which need 10 T in traditional GaAs QHR samples.The magnet will be difficult and expensive to made.With the development of QHR,it is urgent to find methods to develop QHR samples of low magnetic field.Three schemes for reproducing QHE under low magnetic field,including GaAs,graphene and ferromagnetic topological materials are introduced.The advantages and disadvantages of three schemes are analyzed from the dimensions of magnetic field,temperature,measurement uncertainty and technology maturity,to provide theoretical reference for the development of QHR in low magnetic field for China.

Key words: Metrology, Quantum Hall Resistance, GaAs, Graphene